EXCITATION OF RESONANCE PHENOMENA DURING THE MAGNETRON SPUTTERING OF THIN METALLIC FRACTAL FILMS
Regular structures on the surface of materials give to them uncommonly properties. In the report are given some results of investigating the resonance phenomena, which appear under the cap of installation for the magnetron sputtering
during the arrangement under it of semiconductor plate with the self-affine relief of surface. Some results of investigating the resonance phenomena, which appear under the cap of installation for the magnetron sputtering are given. These phenomena are excited by the device, which is silicon disk with the self-affine relief of surface.