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Underetching from simple stochastic etching kinetics

Jens Christian Claussen, J\"urgen Carstensen
The morphological richness of electrochemical semiconductor etching is not sufficiently counterparted yet by theoretical modeling.
This paper investigates a minimal version of the Current-Burst model with Aging of F\"oll and Carstensen and demonstrates for a
restricted geometry that the Aging concept is essential for underetching, or cavity generation.
If the influence of Aging is neglected, the dynamics reduces to a Random Etching Model similar to the Random Deposition model.
This computer {\sl gedanken experiment} demonstrates that the stochastic dynamics with ageing-dependent kinetic reaction probabilities
accounts for the different etching morphologies compared to those obtained in surface roughening and related systems.
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